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Japan Science Engineering Co.,Ltd.(DNK)
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        • Exposure system for experimentation and research
        • Exposure system for compound semiconductor (mask aligner)
        • Exposure machine for Ø200mm and Ø300mm
          • Ø200mm compatible exposure equipment
          • Ø300mm compatible exposure equipment
        • Maskless exposure system
        • Exposure system for MEMS
        • Exposure system for films
        • Exposure system for FPDs
          • Proximity exposure system for G1~G4.5 substrates
          • Vertical proximity exposure system for G3~G5 substrates
          • Vertical exposure system for supersize
        • Exposure system for other mass production
        • Substrate Encapsulatie system
        • Desktop Mask Aligner
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Products

Exposure system for experimentation and research

 Exposure system for experimentation and research

For experimentation, research and small-lot production

Exposure system for compound semiconductor (mask aligner)

 Exposure system for compound semiconductor

(Mask Aligner)

Exposure system for LED, LD packaging

Exposure machine for Ø200mm and Ø300mm

 Exposure machine for Ø200mm and Ø300mm

Exposure machine for Ø200mm and Ø300mm

Maskless exposure system

 Maskless exposure system

Maskless exposure system, MX series

Exposure system for MEMS

 Exposure system for MEMS

Exposure system for MEMS employing the “Moving UV Mask” method

Exposure system for films

 Exposure system for films

Exposure system for flexible substrates, Roll to Roll compatible.

Exposure system for FPDs

 Exposure system for FPDs

Exposure system for flat panel displays

Exposure system for other mass production

 Exposure system for other mass production

Exposure system for liquid crystal, ceramic capacitor, thermal heads or etc

Substrate Encapsulatie system

 Substrate Encapsulatie system

Substrate Encapsulatie system, ES-series

Desktop Mask Aligner

 Desktop Mask Aligner

Compact design that can be installed on a desk.

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