Main feature

  • Original mirror optical system lamp housing integrated,realizing uniform in-plane irradiation and high irradiance.
  • Original coaxial alignment method and high speed image processing technique employed realizing high precision alignment. Also compatible with IR or backside-view method.
  • Original optical gap sensors enable making a desired mask-wafer proximity gap contactlessly with high speed & accuracy.
  • Mask changer integrated changing Max. 20 photomasks automatically.
  • Max. 3 load ports can be mounted.
12inch compatible exposure equipment

Main spec

Wafer sizeØ300mm
AlignmentNon-contact pre-alignment to auto alignment available
Light sourceSuper high-pressure mercury lamp:3.5kW
Main body dimensionsW 2450 × D 2400 × H 2300 mm

※Custom substrate size, mercury lamp wattage or other special spec available.