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Japan Science Engineering Co.,Ltd.(DNK)
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        • Exposure system for experimentation and research
        • Exposure system for compound semiconductor (mask aligner)
        • Exposure machine for Ø200mm and Ø300mm
          • Ø200mm compatible exposure equipment
          • Ø300mm compatible exposure equipment
        • Maskless exposure system
        • Exposure system for MEMS
        • Exposure system for films
        • Exposure system for FPDs
          • Proximity exposure system for G1~G4.5 substrates
          • Vertical proximity exposure system for G3~G5 substrates
          • Vertical exposure system for supersize
        • Exposure system for other mass production
        • Substrate Encapsulatie system
        • Desktop Mask Aligner
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        • Ideal collimated light
        • Structure of lamp housings
        • LCD color filter production processes
        • The “Moving UV mask” method
        • Maskless exposure technique
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Main facilities

About usMain facilities
  • ミツトヨ製三次元測定機
    Large-size scanner made by MITSUTOYO
  • RENISHAW レーザー測長システム
    Laser measurement system made by RENISHAW
  • ミツトヨ製大型三次元測定器
    Large-size 3D scanner made by MITSUTOYO
  • YASDA製マシニングセンタ
    Machining center made by YASDA
  • マキノ製縦型マシニングセンタV77型
    Vertical machining center model V77 made by MAKINO
  • ミツトヨCNC画像測定器
    Quick Vision (image measurement) made by Mitsutoyo
  • 日立製走査電子顕微鏡システム
    Scaning electron microscope system made by HITACHI
  • Nikon製光電式オートコリメータ
    Photoelectric autocollimator made by Nikon
  • 真円度・円筒形状測定器
    Roundness and cylindrical shape surveyors
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