Exposure system that prints patterns on photoresist-coated substrates aligned with a mask.

Main feature

  • Automatic proximity exposure system capable of exposing a substrate in its full exposure area at a time.
  • Custom machine composition is available such as liquid crystal, ceramic capacitor, thermal heads or etc. to meet the customers’ requests.
  • Auto alignment feature implemented. (MA-4000)
その他量産用露光装置

MA-2000~4000series