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• Products
  • Exposure system for FPDs
    • Proximity exposure system for G1～G4.5 substrates
    • Vertical exposure system for supersize
    • Vertical proximity exposure system for G3～G5 substrates
  • Exposure system for compound semiconductor (mask aligner)
  • Exposure machine for Ø200mm and Ø300mm
    • Ø200mm compatible exposure equipment
    • Ø300mm compatible exposure equipment
  • Exposure system for other mass production
  • Exposure system for experimentation and research
  • Exposure system for films
  • Exposure system for MEMS
  • Substrate Encapsulatie system
  • Maskless exposure system
  • Desktop Mask Aligner
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• Technologies
  • Optomechatronics
  • Ideal collimated light
  • Structure of lamp housings
  • LCD color filter production processes
  • The “Moving UV mask” method
  • Maskless exposure technique
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