| 2025 | Development and shipment of 8.6th Generation (H) Roll-to-Roll Double-Sided Exposure Systems started. |
| 2023 | Construction of a new South Building at the Eastern Factory premises. |
| 2021 | Development and sales of a Desktop Mask Aligner started. |
| 2020 | Development and sales of a new mask aligner for φ8” wafer started. |
| 2019 | Awarded the SCREEN GA2019 Best Supplier Award |
| 2018 | Started sales of exposure system with LED lamp-house |
| 2017 | Merged INDEX Technologies Co.,Ltd. |
| 2015 | Establishment of new Tokyo Office in Kanda, Chiyoda-ku,Tokyo. |
| 2014 | Developed new Double-sided simultaneous exposure system for Film.(Roll to Roll) Developed new Mask-less exposure for pattern of 1μm |
| 2013 | First shipment of newly developed titler for wafer. |
| 2012 | First shipment of newly developed exposure system for inductor. |
| 2011 | Development of a stepper for LEDs and LDs. |
| 2010 | First shipments of newly developed new model image processor (GA-LITE). Developed new Mask-less exposure for pattern of 3μm-5μm |
| 2009 | Received a continued respect for being an excellent taxpayer from Kyoto Ukyo tax office. Obtained the production & selling rights of a laser repairer. |
| 2008 | Succeeded in developing a MUM (Moving UV Mask) exposure system and won the METI KANSAI Front Runner Award. First shipments of newly developed exposure systems for TOUCH PANELS. |
| 2007 | Developed an exposure system for 3-D MEMS. |
| 2006 | INDEX Technologies Co., Ltd. established with a capital of 240 million yen as a Joint venture with Ball Semiconductor Co., Ltd., Head Office located in Kyoto City South. Launched a development of new Mask-less Exposure. Registered Step 2 of KES environmental management system. |
| 2005 | Establishment of new Yokoohji factory in Fushimi-ku Kyoto City. |
| 2004 | Construction of new Second Eastern Factory (accommodating large-size systems) in the Eastern Factory premises. |
| 2003 | Establishment of new Kuze factory in Kyoto City South. First shipment of newly developed roll-to-roll exposure systems for PWBs. First shipments of newly developed exposure systems for LEDs and LDs. |
| 2002 | First shipment of newly developed sealing systems for organic electroluminescent displays. Developed a biaxial step exposure system for 5th-generation displays. |
| 2001 | First shipment of newly developed exposure systems for organic electroluminescent displays. |
| 2000 | Establishment of service facilities in Korea and Taiwan. |
| 1999 | Obtained IS0 9001 Certification |
| 1998 | First shipment of newly developed exposure systems for the mass production of PCBs. First shipment of newly developed vertical step exposure systems. |
| 1997 | Received the Advanced Award from the Minister of Welfare and Labor during National Safety Week. Received a continued respect for being an excellent taxpayer from Kyoto Ukyo tax office. First shipment of newly developed exposure systems for PDPs. |
| 1996 | First shipment of vertical proximity exposure systems for large-size boards. Installation of a clean room that accommodates large-size systems on the first floor of the Eastern Factory. Launched the operation of the corporate LAN system. |
| 1994 | Launched a development of LCD mass-production systems for third, phase lines. |
| 1993 | First shipment of titlers. First shipment of line width measurement systems. |
| 1992 | Held the ceremony for the 25th anniversary of the foundation. Awarded the Director’s Award by the director of the Labor Standards Bureau during National Safety Week. Received a continued respect for being an excellent taxpayer from Kyoto Ukyo tax office. Introduced CAD systems on a full-fledged basis. |
| 1991 | Installation of a clean room on the second floor of the Eastern Factory. |
| 1990 | First shipment of proximity step exposure systems with a transformational stage for large-size boards. |
| 1989 | First shipment of non-contact proximity exposure systems with gap sensors for large-size boards. Establishment of new Eastern Factory in Kyoto City South. First shipment of automatic alignment exposure systems with two-dimensional CCD sensors. |
| 1988 | Developed gap sensors. First shipment of step exposure systems for hybrid substrates. |
| 1987 | Held the ceremony for the 20th anniversary of the foundation. Awarded the Progress Award by the director of the Labor Standards Bureau during National Safety Week. |
| 1986 | Developed high-performance vertical auto-handler for TAB systems. |
| 1985 | Developed a positioning system with two-dimensional CCD sensors. |
| 1984 | First shipment of automatic alignment exposure systems for LCD color filters. First shipment of exposure systems installed with a new type of large-size light source. |
| 1983 | Launched a development of large-size exposure systems for LCDs. |
| 1982 | Held the ceremony for the 15th anniversary of the foundation. First shipment of automatic alignment exposure systems for LCDs. Installation of a clean room in the head office factory. First shipment of automatic alignment exposure systems for thermal print heads |
| 1981 | Establishment of new Oharano factory in Kyoto City West. Developed an automatic aligner based on line sensing technology. |
| 1980 | Developed a large-size mask automatic drafting system. |
| 1979 | Construction of the south building in the head office premises. Introduced office computers to the head office factory to promote office automation. |
| 1977 | First shipment of scanning exposure systems for thermal print heads. First shipment of scanning exposure systems for LCDs. First shipment of test handlers. |
| 1976 | Developed a new type of light source system based on an ellipsoilal multi-lens configuration. |
| 1975 | First shipment of TAB exposure systems. |
| 1974 | Establishment of Head Office and Factory in Mukou City, Kyoto. First shipment of vacuum contact exposure systems. |
| 1973 | First shipment of new model, precision reduction cameras. First shipment of automatic contact printers. |
| 1971 | First shipments of aligners for thermal print head testing. Capital increases to 50 million yen. |
| 1970 | Developed an automatic drafting system for semiconductor masks. Capital increases to 40 million yen. |
| 1969 | First shipment of four-barrel fully-automatic reduction cameras that are capable of multiple-area exposure. |
| 1968 | First shipment of semiconductor exposure units, masking systems. and dual-comparison measurement systems. Capital increases to 25 million yen. |
| 1967 | apan Science Engineering Co., Ltd. established with a capital of 2.5 million yen. Head Office located in Kamigyo Ward, Kyoto City. |
About usCompany Landmarks


