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Japan Science Engineering Co.,Ltd.(DNK)
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        • Exposure system for experimentation and research
        • Exposure system for compound semiconductor (mask aligner)
        • Exposure machine for Ø200mm and Ø300mm
          • Ø200mm compatible exposure equipment
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        • Maskless exposure system
        • Exposure system for MEMS
        • Exposure system for films
        • Exposure system for FPDs
          • Proximity exposure system for G1~G4.5 substrates
          • Vertical proximity exposure system for G3~G5 substrates
          • Vertical exposure system for supersize
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        • Substrate Encapsulatie system
        • Desktop Mask Aligner
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        • The “Moving UV mask” method
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Main facilities

About usMain facilities
ミツトヨ製三次元測定機
Large-size scanner made by MITSUTOYO
RENISHAW レーザー測長システム
Laser measurement system made by RENISHAW
ミツトヨCNC画像測定器
Quick Vision (image measurement) made by Mitsutoyo
日立製走査電子顕微鏡システム
Scaning electron microscope system made by HITACHI
Nikon製光電式オートコリメータ
Photoelectric autocollimator made by Nikon
真円度・円筒形状測定器
Roundness and cylindrical shape surveyors
YASDA製マシニングセンタ
Machining center made by YASDA
マキノ製縦型マシニングセンタV77型
Vertical machining center model V77 made by MAKINO
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