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Japan Science Engineering Co.,Ltd.(DNK)
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        • Exposure system for experimentation and research
        • Exposure system for compound semiconductor (mask aligner)
        • Exposure machine for Ø200mm and Ø300mm
          • Ø200mm compatible exposure equipment
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        • Maskless exposure system
        • Exposure system for MEMS
        • Exposure system for films
        • Exposure system for FPDs
          • Proximity exposure system for G1～G4.5 substrates
          • Vertical proximity exposure system for G3～G5 substrates
          • Vertical exposure system for supersize
        • Exposure system for other mass production
        • Substrate Encapsulatie system
        • Desktop Mask Aligner
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        • Optomechatronics
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        • The “Moving UV mask” method
        • Maskless exposure technique
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