Main feature
- Our proprietary high-speed image processing technology enables precise mask-to-wafer alignment.
- Installing Automatic Mask Changer allows the system to support Mask Library.
- Non-Contact Pre-Aligner achieves high-precision loading without damaging the wafer.
- A parallelism correction mechanism achieves highly accurate control of the proximity gap between the mask and the wafer.
- Our proprietary mirror optical system integrated into Lamp House enables high uniformity and high irradiance across the exposure area.
Main Specifications
| MA-4301ML | |
|---|---|
| Wafer size | Ø200mm／Ø300ｍｍ |
| Cycle Time | 32 sec/wafer |
| Alignment Accuracy | Frontside alignment accuracy：±1μm Backside alignment accuracy：±1.5μm |
| Gap Setting Range | 1～200 μm |
| Exposure Mode | Proximity / Soft contact / Hard contact / Vacuum contact |
| Main Unit Dimensions | W2600×D2300×H2350 mm |
※Custom substrate size, mercury lamp wattage or other special spec available.
