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Company Landmarks
2017 Merged INDEX Technologies Co.,Ltd.
2015 Establishment of new Tokyo Office in Kanda, Chiyoda-ku,Tokyo.
2014

Developed new Double-sided simultaneous exposure system for Film.(Roll to Roll)

Developed new Mask-less exposure for pattern of 1μm

2013 First shipment of newly developed titler for wafer.
2012 First shipment of newly developed exposure system for inductor.
2011 Development of a stepper for LEDs and LDs.
2010

First shipments of newly developed new model image processor (GA-LITE).

Developed new Mask-less exposure for pattern of 3μm-5μm

2009

Received a continued respect for being an excellent taxpayer from Kyoto Ukyo tax office.

Obtained the production & selling rights of a laser repairer.

2008

Succeeded in developing a MUM (Moving UV Mask) exposure system and won the METI KANSAI Front Runner Award.

First shipments of newly developed exposure systems for TOUCH PANELS.

2007 Developed an exposure system for 3-D MEMS.
2006

INDEX Technologies Co., Ltd. established with a capital of 240 million yen as a Joint venture with Ball Semiconductor Co., Ltd., Head Office located in Kyoto City South. Launched a development of new Mask-less Exposure.

Registered Step 2 of KES environmental management system.

2005

Establishment of new Yokoohji factory in Fushimi-ku Kyoto City.

2004

Construction of new Second Eastern Factory (accommodating large-size systems) in the Eastern Factory premises.

2003

Establishment of new Kuze factory in Kyoto City South.

First shipment of newly developed roll-to-roll exposure systems for PWBs.

First shipments of newly developed exposure systems for LEDs and LDs.

2002

First shipment of newly developed sealing systems for organic electroluminescent displays.

Developed a biaxial step exposure system for 5th-generation displays.

2001

First shipment of newly developed exposure systems for organic electroluminescent displays.

2000

Establishment of service facilities in Korea and Taiwan.

1999

Obtained IS0 9001 Certification

1998

First shipment of newly developed exposure systems for the mass production of PCBs.

First shipment of newly developed vertical step exposure systems.

1997

Received the Advanced Award from the Minister of Welfare and Labor during National Safety Week.

Received a continued respect for being an excellent taxpayer from Kyoto Ukyo tax office.

First shipment of newly developed exposure systems for PDPs.

1996

First shipment of vertical proximity exposure systems for large-size boards.

Installation of a clean room that accommodates large-size systems on the first floor of the Eastern Factory.

Launched the operation of the corporate LAN system.

1994

Launched a development of LCD mass-production systems for third, phase lines.

1993

First shipment of titlers.

First shipment of line width measurement systems.

1992

Held the ceremony for the 25th anniversary of the foundation.

Awarded the Director's Award by the director of the Labor Standards Bureau during National Safety Week.

Received a continued respect for being an excellent taxpayer from Kyoto Ukyo tax office.

Introduced CAD systems on a full-fledged basis.

1991

Installation of a clean room on the second floor of the Eastern Factory.

1990

First shipment of proximity step exposure systems with a transformational stage for large-size boards.

1989

First shipment of non-contact proximity exposure systems with gap sensors for large-size boards.

Establishment of new Eastern Factory in Kyoto City South.

First shipment of automatic alignment exposure systems with two-dimensional CCD sensors.

1988

Developed gap sensors.

First shipment of step exposure systems for hybrid substrates.

1987

Held the ceremony for the 20th anniversary of the foundation.

Awarded the Progress Award by the director of the Labor Standards Bureau during National Safety Week.

1986

Developed high-performance vertical auto-handler for TAB systems.

1985

Developed a positioning system with two-dimensional CCD sensors.

1984

First shipment of automatic alignment exposure systems for LCD color filters.

First shipment of exposure systems installed with a new type of large-size light source.

1983

Launched a development of large-size exposure systems for LCDs.

1982

Held the ceremony for the 15th anniversary of the foundation.

First shipment of automatic alignment exposure systems for LCDs.

Installation of a clean room in the head office factory.

First shipment of automatic alignment exposure systems for thermal print heads

1981

Establishment of new Oharano factory in Kyoto City West.

Developed an automatic aligner based on line sensing technology.

1980

Developed a large-size mask automatic drafting system.

1979

Construction of the south building in the head office premises.

Introduced office computers to the head office factory to promote office automation.

1977

First shipment of scanning exposure systems for thermal print heads.

First shipment of scanning exposure systems for LCDs.

First shipment of test handlers.

1976

Developed a new type of light source system based on an ellipsoilal multi-lens configuration.

1975

First shipment of TAB exposure systems.

1974 Establishment of Head Office and Factory in Mukou City, Kyoto.

First shipment of vacuum contact exposure systems.

1973

First shipment of new model, precision reduction cameras. First shipment of automatic contact printers.

1971

First shipments of aligners for thermal print head testing.

Capital increases to 50 million yen.

1970

Developed an automatic drafting system for semiconductor masks.

Capital increases to 40 million yen.

1969

First shipment of four-barrel fully-automatic reduction cameras that are capable of multiple-area exposure.

1968

First shipment of semiconductor exposure units, masking systems. and dual-comparison measurement systems.

Capital increases to 25 million yen.

1967

apan Science Engineering Co., Ltd. established with a capital of 2.5 million yen. Head Office located in Kamigyo Ward, Kyoto City.

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