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Exposure system for experimentation and research
Exposure system for compound semiconductor (mask aligner)
Exposure machine for Ø200mm and Ø300mm
Ø200mm compatible exposure equipment
Ø300mm compatible exposure equipment
Maskless exposure system
Exposure system for MEMS
Exposure system for films
Exposure system for FPDs
Proximity exposure system for G1～G4.5 substrates
Vertical proximity exposure system for G3～G5 substrates
Vertical exposure system for supersize
Exposure system for other mass production
Substrate Encapsulatie system
Desktop Mask Aligner
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Optomechatronics
Ideal collimated light
Structure of lamp housings
LCD color filter production processes
The “Moving UV mask” method
Maskless exposure technique
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+81-75-922-1146
